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晶圓研磨wafergrindingGDM300_OKAMOTO拋光減薄機
晶圓研磨wafergrindingGDM300_OKAMOTO拋光減薄機
產品價格:¥\u9762\u8bae(人民幣)
  • 規格:完善
  • 發貨地:上海上海
  • 品牌:
  • 最小起訂量:1
  • 免費會員
    會員級別:試用會員
    認證類型:企業認證
    企業證件:通過認證

    商鋪名稱:上海衡鵬企業發展有限公司

    聯系人:陳靜靜(小姐)

    聯系手機:

    固定電話:

    企業郵箱:lee.li@hapoin.com

    聯系地址:上海市徐匯區田州路159號蓮花大廈3樓B座

    郵編:200233

    聯系我時,請說是在線纜網上看到的,謝謝!

    商品詳情
      產品參數
      品牌OKAMOTO
      英文名wafer grinding
      品名晶圓研磨
      別名晶圓拋光減薄機
      產地日本
      加工直徑Ф300mm
      主軸轉速范圍0~3000rpm
      主軸驅動電機功率5.5/4 Kw/P
      主軸進給速度范圍1~999μm/min
      主軸數2
      工作盤轉速范圍1~300rpm
      研磨輪尺寸Ф300mm
      重量8200kg
      可售賣地北京;天津;河北;山西;內蒙古;遼寧;吉林;黑龍江;上海;江蘇;浙江;安徽;福建;江西;山東;河南;湖北;湖南;廣東;廣西;海南;重慶;四川;貴州;云南;西藏;陜西;甘肅;青海;寧夏;新疆
      類型全自動
      型號GDM300




      OKAMOTO GDM300晶圓研磨/晶圓拋光減薄機概要:
      Model GDM300 grinder is a fully automatic continuous downfeed grinding machine with dual polishing stations for increased throughput. Wafers are handled through the machine by a 6-axis robot, and load/unload arms designed for 25 um capability. An optional edge trimming system is recommended for eliminating edge chipping for thin wafers. Chuck speed, grinding wheel, and grind spindle downfeed rate speeds can be used to manipulate grinder throughput, surface finish, and wheel life.A two-point in-process gauge measuring system controls wafer thickness under grind spindles 1 and 2 with an optional laser detection for a more precision thickness accuracy (recommended for < 50 um). Programmable oscillating polish heads can be programmed to maintain wafer profile (ttv) in conjunction with with the optional motorized spindle angle adjustment.


      晶圓研磨/晶圓拋光減薄機GDM300特點:
      The process from back grinding to wafer mounting continuously by fully automatic system,
      With 2 head polishing stage, throughput is almost double compared with 1 polish head system.
      Built in edge trimming system is available as an option for thin wafer process.
      Dual index system, which polishing stage and grinding stage is completely separated,
      satisfy the cleanness required for TSV and MEMS process.
      Less than Ra1? ultra luminance, ultra mirror surface is possible.


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